A na-eme ka wafer silicon dioxide dị nkọ, nke a na-akpọ SiO2 wafer, nke a na-eme ka ọ dị mma ma dịkwa mma maka ule.
Ntinye nke igbe wafer
| Ngwaahịa | Wafers Oxide (Si+SiO2) nke na-ekpo ọkụ |
| Ụzọ Mmepụta | LPCVD |
| Ịchacha Elu | SSP/DSP |
| Dayameta | 2inch / 3inch / 4inch / 5inch / 6inch |
| Ụdị | Ụdị P / Ụdị N |
| Ọkpụrụkpụ oyi akwa oxidation | 100nm ~ 1000nm |
| Nhazi | <100> <111> |
| Nguzogide eletriki | 0.001-25000(Ω•cm) |
| Ngwa | Ejiri ya maka ihe nlele ihe nlele synchrotron, mkpuchi PVD/CVD dị ka ihe ndabere, ihe nlele uto magnetron sputtering, XRD, SEM,Ike atọm, infrared spectroscopy, fluorescence spectroscopy na ihe ndị ọzọ e ji eme nyocha, ihe ndị e ji epitaxial growth substrates mee, X-ray analysis nke crystalline semiconductors |
Wafers silicon oxide bụ ihe nkiri silicon dioxide a na-akụ n'elu wafers silicon site na oxygen ma ọ bụ mmiri na okpomọkụ dị elu (800°C ~ 1150°C) site na iji usoro oxidation okpomọkụ na ngwa ọkpọkọ ikuku. Ọkpụrụkpụ nke usoro ahụ sitere na nanomita 50 ruo micron 2, okpomọkụ usoro ahụ ruru ogo 1100 Celsius, a na-ekewa usoro uto ahụ n'ụdị abụọ "oxygen mmiri" na "oxygen akọrọ". Thermal Oxide bụ oyi akwa oxide "toro eto", nke nwere otu nha, njupụta ka mma na ike dielectric dị elu karịa oyi akwa oxide CVD, nke na-eme ka mma.
Oxidation Oxygen Akọrọ
Silicon na-emeghachi omume na oxygen, oyi akwa oxide na-agakwa n'ihu na oyi akwa substrate mgbe niile. A chọrọ ka e mee oxidation akọrọ na okpomọkụ site na 850 ruo 1200°C, yana obere uto, a pụkwara iji ya maka uto ọnụ ụzọ MOS. A na-ahọrọ oxidation akọrọ karịa oxidation mmiri mgbe achọrọ oyi akwa silicon oxide dị elu ma dị gịrịgịrị. Ike oxidation akọrọ: 15nm ~ 300nm.
2. Mmiri Oxidation
Usoro a na-eji uzuoku mmiri emepụta oyi akwa oxide site n'ịbanye na ọkpọkọ ọkụ n'okpuru ọnọdụ okpomọkụ dị elu. Njupụta nke oxidation oxygen mmiri dị ntakịrị njọ karịa oxidation oxygen akọrọ, mana ma e jiri ya tụnyere oxidation oxygen akọrọ, uru ya bụ na ọ nwere ọnụego uto dị elu, dabara adaba maka uto ihe nkiri karịrị 500nm. Ike oxidation mmiri mmiri: 500nm ~ 2µm.
Ọkụ ọkụ nke AEMD nke na-eme ka nrụgide ikuku ghara ịdị irè bụ ọkpọkọ ọkụ kwụ ọtọ nke Czech, nke a na-eji usoro dị elu, ịdị mma nke ihe nkiri na njikwa ihe dị elu. Ọkụ ọkụ silicon oxide nwere ike ịhazi ihe ruru wafer 50 kwa ọkpọkọ, yana ezigbo nha nha n'ime na n'etiti wafers.
Ihe osise zuru ezu
