Ngwa Wafer Thinking maka nhazi Wafer Sapphire/SiC/Si nke dị sentimita 4-12

Nkọwa Dị Mkpirikpi:

Ngwa Wafer Thinning bụ ngwa dị oke mkpa n'imepụta semiconductor maka ibelata ọkpụrụkpụ wafer iji mee ka njikwa okpomọkụ, arụmọrụ eletriki, na arụmọrụ nkwakọ ngwaahịa dịkwuo mma. Ngwa a na-eji igwe egweri igwe, polishing mechanical chemical (CMP), na teknụzụ etching akọrọ/mmiri iji nweta njikwa ọkpụrụkpụ nke ukwuu (±0.1 μm) na ndakọrịta na wafers 4-12-inch. Sistemụ anyị na-akwado ntụzịaka C/A-plane ma ahaziri ya maka ngwa dị elu dịka 3D ICs, ngwaọrụ ike (IGBT/MOSFETs), na sensọ MEMS.

XKH na-enye ngwọta zuru oke, gụnyere akụrụngwa ahaziri ahazi (nhazi wafer nke 2-12-inch), nhazi usoro (njupụta ntụpọ <100/cm²), na ọzụzụ teknụzụ.


atụmatụ

Ụkpụrụ Ọrụ

Usoro ịcha wafer na-arụ ọrụ site na nkebi atọ:
Ịchacha ihe siri ike: wheel dayamọnd (nha grit 200–500 μm) na-ewepụ 50–150 μm nke ihe na 3000–5000 rpm iji belata ọkpụrụkpụ ngwa ngwa.
Ịchacha nke ọma: wheel dị nro (nha grit 1–50 μm) na-ebelata ọkpụrụkpụ ruo 20–50 μm na <1 μm/s iji belata mmebi dị n'okpuru ala.
Ịchacha ihe (CMP): Slurry kemịkalụ na-ewepụ mmebi fọdụrụ, na-erute Ra <0.1 nm.

Ihe Ndị Dakọtara

Silicon (Si): Ọkọlọtọ maka wafers CMOS, nke a na-eme ka ọ dị gịrịgịrị ruo 25 μm maka nhazi 3D.
Silicon Carbide (SiC): Chọrọ wiil dayamọnd pụrụ iche (njupụta dayamọnd 80%) maka nkwụsi ike okpomọkụ.
Safaịre ​​(Al₂O₃): E megharịrị ruo 50 μm maka ojiji UV LED.

Akụkụ Sistemụ Isi

1. Sistemụ Ịkụ Nkụ
Ngwakọta ihe eji agwakọta ihe abụọ: Na-ejikọta igwe egweri siri ike/nke dị mma n'otu ikpo okwu, na-ebelata oge okirikiri site na 40%.
Spindle Aerostatic: Oke ọsọ 0–6000 rpm yana radial runout <0.5 μm.

2. Sistemụ Njikwa Wafer
Igwe ọkụ: ike ijide ihe karịrị 50 N, nke dabara na ±0.1 μm.
Ogwe aka robot: Na-ebuga wafers nke dị sentimita 4–12 na 100 mm/s.

3. Sistemụ Njikwa
Interferometry Laser: Nlekota ọkpụrụkpụ oge (mkpebi 0.01 μm).
AI-Driven Feedforward: Na-ebu amụma iyi wiil ma na-agbanwe paramita na akpaghị aka.

4. Ịjụ oyi na nhicha
Nhicha Ultrasonic: Na-ewepụ ihe ndị dị n'ime ya karịa 0.5 μm ma na-arụ ọrụ nke ọma ruo 99.9%.
Mmiri e tinyere n'ọkụ: Ọ na-eme ka wafer dị jụụ ruo ihe dịka <5°C karịa ihe dị n'ime ya.

Uru Isi

1. Oke Nkọcha Elu: TTV (Mgbanwe Oke Ọkpụrụkpụ) <0.5 μm, WTW (Mgbanwe Oke Ọkpụrụkpụ n'ime Wafer) <1 μm.

2. Njikọta Ọtụtụ Usoro: Na-ejikọta igwe e ji egweri ihe, CMP, na ihe e ji emechi plasma n'otu igwe.

3. Ndakọrịta Ihe:
Silicon: Mbelata ọkpụrụkpụ site na 775 μm ruo 25 μm.
SiC: Na-enweta ihe dịka 2 μm TTV maka ngwa RF.
Wafers e tinyere n'ime mmiri: Wafers InP nke e tinyere n'ime mmiri phosphorus nwere ihe na-erughị 5% nke iguzogide.

4. Smart Automation: Njikọta MES na-ebelata mmejọ mmadụ site na 70%.

5. Ike arụmọrụ: 30% belata oriri ike site na iji brek nrụpụta.

Ngwa Ndị Dị Mkpa

1. Nkwakọ ngwaahịa dị elu
• 3D ICs: Mkpụcha Wafer na-eme ka e nwee ike itinye ihe ndị dị n'ime ya n'usoro (dịka ọmụmaatụ, HBM stacks), na-enweta bandwidth dị elu nke 10× na mbelata oriri ike nke 50% ma e jiri ya tụnyere ngwọta 2.5D. Ngwaọrụ a na-akwado njikọ ngwakọ na njikọta TSV (Through-Silicon Via), nke dị oke mkpa maka ndị nhazi AI/ML nke chọrọ njikọ <10 μm. Dịka ọmụmaatụ, wafers dị sentimita iri na abụọ nke dị sentimita iri na abụọ nke dị sentimita iri na abụọ nke dị sentimita iri na ise na-enye ohere ka e tinye ihe karịrị oyi akwa 8 ma na-ejigide <1.5% warpage, nke dị mkpa maka sistemụ LiDAR ụgbọala.

• Nkwakọba Fan-Out: Site na ibelata ọkpụrụkpụ wafer ruo 30 μm, a na-ebelata ogologo njikọ site na 50%, na-ebelata igbu oge mgbaàmà (<0.2 ps/mm) ma na-enye ohere ka chiplets 0.4 mm dị gịrịgịrị maka SoCs mkpanaka. Usoro a na-eji algọridim egweri nrụgide akwụgoro iji gbochie warpage (>50 μm njikwa TTV), na-ahụ na a pụrụ ịtụkwasị obi na ngwa RF ugboro ugboro dị elu.

2. Elektrọniki Ike
• Modulu IGBT: Ịbelata ruo 50 μm na-ebelata iguzogide okpomọkụ ruo <0.5°C/W, na-eme ka 1200V SiC MOSFETs rụọ ọrụ na okpomọkụ njikọ 200°C. Ngwaọrụ anyị na-eji igwe egweri ọtụtụ ogbo (nkọwa: 46 μm grit → fine: 4 μm grit) iji wepụ mmebi dị n'okpuru ala, na-enweta ihe karịrị okirikiri 10,000 nke ntụkwasị obi nke ịgbagharị okpomọkụ. Nke a dị oke mkpa maka inverters EV, ebe wafer SiC dị 10 μm dị arọ na-eme ka ọsọ mgbanwe dịkwuo mma site na 30%.
• Ngwaọrụ Ike GaN-on-SiC: Mbelata Wafer ruo 80 μm na-eme ka ngagharị elektrọn (μ > 2000 cm²/V·s) maka 650V GaN HEMTs, na-ebelata mfu conduction site na 18%. Usoro a na-eji dicing enyere laser aka igbochi mgbawa n'oge ịcha, na-enweta ihe na-erughị 5 μm chipping edge maka amplifiers ike RF.

3. Optoelectronics​
• Ọkụ LED GaN-on-SiC: ihe ndị dị na sapphire 50 μm na-eme ka arụmọrụ mwepụta ìhè (LEE) dịkwuo elu ruo 85% (ma e jiri ya tụnyere 65% maka wafers 150 μm) site n'ibelata njide foton. Njikwa TTV dị ala nke akụrụngwa anyị (<0.3 μm) na-eme ka mwepụta LED dị otu n'ofe wafers 12-inch, nke dị mkpa maka ngosipụta Micro-LED nke chọrọ ka <100nm dịrị n'otu.
• Silicon Photonics: Wafer silicon dị 25μm dị arọ na-eme ka mfu mgbasa 3 dB/cm dị ala na waveguides, nke dị mkpa maka transceivers optical 1.6 Tbps. Usoro a na-ejikọta CMP smoothing iji belata iru unyi elu ruo Ra <0.1 nm, na-eme ka arụmọrụ njikọ dịkwuo mma site na 40%.

4. Ihe mmetụta MEMS
• Ngwa ngwa: Wafer silicon 25 μm na-enweta SNR >85 dB (vs. 75 dB maka wafer 50 μm) site na ịbawanye mmetụta nke mwepụ ihe mgbochi. Sistemụ igwe anyị na-egweri axis abụọ na-akwụghachi ụgwọ maka mgbanwe nrụgide, na-eme ka <0.5% mmetụta na-agafe karịa -40°C ruo 125°C. Ngwa ndị a gụnyere nchọpụta ihe mberede ụgbọala na nsochi ngagharị AR/VR.

• Ihe Mmetụta Nrụgide: Ịbelata ruo 40 μm na-eme ka nha mmanya 0–300 dị iche iche, yana <0.1% FS hysteresis. Site na iji njikọ nwa oge (ihe ndị na-ebu iko), usoro a na-ezere mgbawa wafer n'oge a na-akpụ ihe n'azụ, na-enweta nnabata nrụgide <1 μm maka ihe mmetụta IoT ụlọ ọrụ mmepụta ihe.

• Njikọta Teknụzụ: Ngwa anyị na-eme ka wafer dị nro na-ejikọta igwe eji akwọ ihe, CMP, na plasma iji dozie nsogbu dị iche iche nke ihe (Si, SiC, Sapphire). Dịka ọmụmaatụ, GaN-on-SiC chọrọ igwe eji agwakọta (wheel diamond + plasma) iji kwado ike na mgbasawanye okpomọkụ, ebe sensọ MEMS chọrọ ka elu dị n'okpuru 5 nm site na iji CMP polishing.

• Mmetụta Ụlọ Ọrụ: Site n'itinye wafers dị gịrịgịrị ma dị elu, teknụzụ a na-akwalite ihe ọhụrụ na chips AI, modulu mmWave 5G, na ngwa eletrọnịkị na-agbanwe agbanwe, yana ntachi obi TTV <0.1 μm maka ngosipụta a na-apịachi apịachi na <0.5 μm maka sensọ LiDAR ụgbọala.

Ọrụ XKH

1. Ngwọta ahaziri ahazi
Nhazi ndị a na-agbanwe agbanwe: Nhazi ụlọ nke dị sentimita 4-12 nwere ibu/ibudata akpaka.
Nkwado maka ọgwụ mgbochi ọrịa: Ntụziaka ahaziri maka kristal Er/Yb na wafers InP/GaAs.

2. Nkwado site na njedebe ruo na njedebe
Mmepe Usoro: Nnwale n'efu na-agba ọsọ na nhazi.
Ọzụzụ zuru ụwa ọnụ: Ọmụmụ ihe teknụzụ kwa afọ gbasara mmezi na nsogbu nsogbu.

3. Nhazi ọtụtụ ihe
SiC: Wafer na-eme ka ọ dị nro ruo 100 μm na Ra <0.1 nm.
Safaịra: Ọkpụrụkpụ 50 μm maka windo laser UV (nzipu >92% @ 200 nm).

4. Ọrụ Ndị E Ji Agbakwunye Uru
Ngwa ahịa: wiil diamond (2000+ wafers/life) na ihe mkpuchi CMP.

Mmechi

Ngwa a na-eme ka wafer dị nro na-enye ezigbo nhazi, ọtụtụ ihe dị iche iche, na akpaaka mara mma, nke na-eme ka ọ dị mkpa maka njikọta 3D na ngwa eletrọniki ike. Ọrụ zuru oke nke XKH - site na nhazi ruo na nhazi mgbe emechara - na-eme ka ndị ahịa nweta arụmọrụ ọnụ ahịa na arụmọrụ kachasị mma na mmepụta semiconductor.

Ngwa Wafer dị mfe ime 3
Ngwa Wafer dị mfe ime 4
Ngwa Wafer dị mfe ime 5

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