SiC Ceramic Tray End Effector Wafer Ijikwa Ngwa Emere Emebere
SiC Ceramic & Alumina Ceramic Custom Components Nkenke
Ngwa ndị omenala seramiiki Silicon Carbide (SiC).
Ihe mejupụtara seramiiki Silicon Carbide (SiC) bụ ihe seramiiki ụlọ ọrụ na-arụ ọrụ dị elu ama ama maka ha.isi ike dị oke elu, nkwụsi ike nke okpomọkụ dị oke mma, nguzogide corrosion pụrụiche, yana ịdị elu thermal conductivity. Ngwa seramiiki Silicon Carbide (SiC) na-enyere aka ịnọgide na-enwe nkwụsi ike n'ụdịgburugburu ebe okpomọkụ dị elu ka ọ na-eguzogide mbuze sitere na acids siri ike, alkalis, na ọla a wụrụ awụ.. A na-arụpụta seramiki SiC site na usoro dịkasintering na-enweghị nrụgide, ngwogharị mmeghachi omume, ma ọ bụ ikpo ọkụ na-ekpo ọkụenwere ike ịhazi ya ka ọ bụrụ ụdị mgbagwoju anya, gụnyere mgbanaka akara igwe, ogwe aka ogwe aka, nozzles, tubes ọkụ, ụgbọ mmiri wafer, na efere mkpuchi na-eguzogide ọgwụ.
Ngwa ihe omenala seramiki alumina
Alumina (Al₂O₃) seramiiki omenala ihe na-emesi ikeelu mkpuchi, ezi n'ibu ike, na eyi iguzogide. Nkewa site na akara ule dị ọcha (dịka ọmụmaatụ, 95%, 99%), Alumina (Al₂O₃) ngwa seramiiki nwere ihe eji arụ ọrụ nke ọma na-enye ohere ka emee ya ka ọ bụrụ ihe mkpuchi, bearings, ngwaọrụ ịkpụ, na ntinye ọgwụ. A na-emepụta seramiki alumina nke ọma site naịpị akọrọ, ịkpụzi injection, ma ọ bụ usoro ịpị nke isostatic, nke nwere elu na-egbuke egbuke ka ọ rụchaa enyo.
XKH ọkachamara na R&D na mmepụta omenala nkesilicon carbide (SiC) na alumina (Al₂O₃) seramiiki. Ngwaahịa seramiiki SiC na-elekwasị anya na okpomọkụ dị elu, uwe elu na gburugburu ebe obibi na-emebi emebi, na-ekpuchi ngwa semiconductor (dịka ọmụmaatụ, ụgbọ mmiri wafer, cantilever paddles, furnace tubes) yana ihe ndị na-ekpo ọkụ ọkụ na ihe mkpuchi dị elu maka akụkụ ike ọhụrụ. Ngwaahịa seramiiki alumina na-emesi mkpuchi mkpuchi, akara, na akụrụngwa biomedical, gụnyere ihe eletrọnịkị, mgbanaka akara igwe, na ntinye ọgwụ. Iji teknụzụ dị kaỊpịpị isostatic, sntering na-enweghị nrụgide, na nhazi nke ọma, anyị na-enye ihe ngwọta ahaziri nke ọma maka ụlọ ọrụ gụnyere semiconductors, fotovoltaics, aerospace, medical, and chemical processing, na-eme ka ihe ndị dị na ya na-ezute ihe ndị dị mkpa maka nkenke, ogologo ndụ, na ntụkwasị obi na ọnọdụ dị oke njọ.
SiC ceramic Functional Chucks & CMP egweri discs Okwu mmalite
SiC Ceramic Vacuum Chucks
Silicon Carbide (SiC) Ceramic Vacuum Chucks bụ ngwa mgbasa ozi dị elu nke arụpụtara site na ihe seramiiki silicon carbide (SiC) arụ ọrụ dị elu. Emebere ha maka ngwa na-achọ ịdị ọcha na nkwụsi ike dị ukwuu, dị ka semiconductor, fotovoltaic, na ụlọ ọrụ nrụpụta nke ọma. Uru ha bụ isi gụnyere: elu enyo enyo dị larịị (a na-achịkwa ịdị larịị n'ime 0.3-0.5 μm), isi ike dị oke elu na ọnụ ọgụgụ dị ala nke mgbasawanye thermal (na-eme ka ọdịdị nano-larịị na nkwụsi ike ọnọdụ), ihe owuwu dị oke fechaa (na-ebelata mmetụ mmegharị ahụ nke ukwuu, na-ebelata ike ọgwụgwụ nke ịdị elu9). karịrị ogologo ndụ nke metal chucks). Ngwongwo ndị a na-eme ka arụ ọrụ kwụsiri ike na gburugburu ebe okpomọkụ dị elu na nke dị ala, corrosion siri ike, na njikwa ọsọ ọsọ, na-eme ka mmepụta nhazi na mmepụta nke ọma maka ihe ndị dị ka wafers na ngwa anya.
Silicon Carbide (SiC) Bump Vacuum Chuck maka usoro ọmụmụ na nyocha
Ezubere maka usoro nyocha ntụpọ wafer, ngwá ọrụ mgbasa ozi dị elu nke a na-arụpụta site na silicon carbide (SiC) seramiiki ihe. Ọdịdị elu ya pụrụ iche na-enye ike mgbasa ozi oghere dị ike ma na-ebelata mpaghara kọntaktị na wafer, si otú a na-egbochi mmebi ma ọ bụ mmetọ n'elu wafer ma hụ nkwụsi ike na izi ezi n'oge nyocha. Nkịta ahụ nwere ọmarịcha flatness (0.3-0.5 μm) na elu enyo na-egbu maramara, jikọtara ya na ịdị arọ dị oke ọkụ na isi ike dị elu iji hụ na nkwụsi ike n'oge mmegharị ọsọ ọsọ. Ọnụ ọgụgụ ya dị oke ala nke mgbasawanye okpomọkụ na-ekwe nkwa nkwụsi ike n'ogo n'okpuru mgbanwe okpomọkụ, ebe nguzogide eyi pụtara ìhè na-agbatị ndụ ọrụ. Ngwaahịa ahụ na-akwado nhazi na nkọwapụta 6, 8, na 12-inch iji gboo mkpa nyocha nke nha wafer dị iche iche.
Mgbanwe nke Chip Bonding Chuck
Flip chip bonding chuck bụ isi ihe dị na usoro njikọ nke chip flip-chip, nke emebere ya maka kpomkwem mgbasa ozi wafers iji hụ na nkwụsi ike n'oge ọrụ njikọta dị elu, dị elu. Ọ na-egosipụta elu enyo na-egbuke egbuke (flatness / parallelism ≤1 μm) na oghere gas nke ọma iji nweta ike mgbasa ozi oghere, na-egbochi mbupụ ma ọ bụ mmebi. Isi ike ya dị elu na ọnụọgụ dị ala nke mgbasawanye thermal (nke dị nso na ihe silicon) na-eme ka nkwụsi ike nke akụkụ dị na gburugburu ebe obibi okpomọkụ, ebe ihe dị elu (dịka ọmụmaatụ, silicon carbide ma ọ bụ ceramics pụrụ iche) na-egbochi ikuku gas, na-ejigide ntụkwasị obi ogologo oge. Àmụmà ndị a na-akwadokọ ọnụ na-akwado izi ezi-ọkwa micron ma na-akwalite mkpụrụ ngwugwu mgbawa nke ukwuu.
SiC Bonding Chuck
Ihe mkpuchi silicon carbide (SiC) bụ isi ihe nrụnye na usoro njikọta mgbawa, emebere ya maka ịgbasa ngwa ngwa na ichekwa wafers, na-ahụ na arụmọrụ kwụsiri ike n'okpuru ọnọdụ okpomọkụ na oke nrụgide. Emepụtara site na seramiiki silicon carbide dị elu (porosity <0.1%), ọ na-enweta nkesa ike adsorption edo (deviation <5%) site na nanometer-level mirror polishing (elu roughness Ra <0.1 μm) na nkenke gas ọwa grooves (pore dayameta: 5-50) ma ọ bụ na-emebi elu elu. Ọnụ ọgụgụ ya dị ala dị ala nke mgbasawanye thermal (4.5 × 10⁻⁶ / ℃) dabara nke ọma na nke silicon wafers, na-ebelata ihe mgbakasị ọkụ na-akpata. Ejikọtara ya na isi ike dị elu (modules na-agbanwe> 400 GPa) na ≤1 μm flatness / parallelism, ọ na-ekwe nkwa nhazi nhazi nke ọma. Ejiri ya na nkwakọ ngwaahịa semiconductor, 3D stacking, na njikọ Chiplet, ọ na-akwado ngwa nrụpụta dị elu chọrọ nanoscale nkenke na nkwụsi ike ọkụ.
CMP-egweri diski
Diski na-egweri CMP bụ akụkụ bụ isi nke akụrụngwa kemịkalụ kemịkalụ polishing (CMP), emebere ya ka ọ jide ma kwụsie ike wafers n'oge polishing dị elu, na-eme ka nhazi ọkwa nanometer zuru ụwa ọnụ. Emebere ya site na njupụta dị elu, ihe dị elu (dịka ọmụmaatụ, silicon carbide ceramics ma ọ bụ alloys ọpụrụiche), ọ na-eme ka mgbasa ozi na-ekpo ọkụ n'otu n'otu site na oghere gas na-arụ ọrụ nkenke. N'elu enyo ya na-egbuke egbuke (flatness / parallelism ≤3 μm) na-ekwe nkwa na kọntaktị na-enweghị nchekasị na wafers, ebe ọnụọgụ dị ala nke mgbasawanye ọkụ (dakọtara na silicon) na ọwa oyi dị n'ime na-egbochi nrụrụ okpomọkụ nke ọma. N'ikwekọ na 12-inch (750 mm dayameta) wafers, diski ahụ na-enye teknụzụ mgbasa ozi iji hụ na njikọta enweghị nkebi na ntụkwasị obi ogologo oge nke ihe owuwu multilayer n'okpuru oke okpomọkụ na nrụgide, na-eme ka usoro CMP dịkwuo n'otu na mkpụrụ.
Okwu mmalite akụkụ SiC ceramics dị iche iche ahaziri
Silicon Carbide (SiC) Square mirror
Silicon Carbide (SiC) Square Mirror bụ akụrụngwa ngwa anya dị elu nke emere site na seramiiki silicon carbide dị elu, emebere ya maka akụrụngwa nrụpụta semiconductor dị elu dị ka igwe lithography. Ọ na-enweta ịdị arọ dị ọkụ na ịdị elu dị elu (modules> 400 GPa) site na nhazi ụkpụrụ dị fechaa (dịka ọmụmaatụ, n'azụ mmanụ a honeyụ), ebe ọnụọgụ mgbasawanye ọkụ ya dị ala (≈4.5 × 10⁻⁻ / ℃ nkwụsi ike n'okpuru ọnọdụ okpomọkụ). Igwe enyo enyo, mgbe ihichachara nke ọma, na-enweta ≤1 μm flatness / parallence, yana nguzogide eyi pụrụ iche (Mohs hardness 9.5) na-agbatị ndụ ọrụ. A na-eji ya eme ihe n'ebe a na-arụ ọrụ igwe lithography, ihe nlegharị anya laser, na teliskop oghere ebe nkwụsi ike na nkwụsi ike dị oke egwu.
Silicon Carbide (SiC) Ntuziaka nlegharị anya ikuku
Silicon Carbide (SiC) Ntuziaka ikuku ikuku na-eji teknụzụ ikuku ikuku na-adịghị emekọrịta ihe, ebe gas abịakọrọ na-etolite ihe nkiri ikuku micron-ọkwa (nke na-abụkarị 3-20μm) iji nweta mmegharị na-adịghị mma na enweghị mkpọtụ. Ha na-enye nanometric mmegharị ziri ezi (ugboro n'ọnọdu ziri ezi ruo ± 75nm) na sub-micron geometric nkenke (nke kwụ ọtọ ± 0.1-0.5μm, flatness ≤1μm), nyeere site mechiri emechi-loop nzaghachi njikwa na nkenke grating akpịrịkpa ma ọ bụ laser interferometers. Isi silicon carbide seramiiki ihe (nhọrọ gụnyere Coresic® SP / Marvel Sic series) na-enye ultra-high stiffness (elastic modulus> 400GPa), ultra-low thermal expansion coefficient (4.0-4.5 × 10⁻⁶/K, silicon dakọtara) na (1%). Nhazi ya dị arọ (njupụta 3.1g / cm³, nke abụọ naanị na aluminom) na-ebelata inertia ngagharị, ebe nguzogide eyi pụrụ iche (Mohs hardness 9.5) na nkwụsi ike nke okpomọkụ na-eme ka ntụkwasị obi dị ogologo oge n'okpuru ọsọ ọsọ (1m / s) na ọnọdụ ngwa ngwa (4G). A na-eji ntuziaka ndị a eme ihe n'ọtụtụ ebe na lithography semiconductor, nyocha wafer, na nrụpụta nke ọma.
Silicon Carbide (SiC) Cross-Beams
Silicon Carbide (SiC) Cross-Beams bụ isi ihe mmegharị emebere maka akụrụngwa semiconductor na ngwa ụlọ ọrụ dị elu, na-arụ ọrụ na-ebu ọkwa wafer ma duzie ha n'ụzọ akọwapụtara maka oke ọsọ, oke oke. N'iji seramiiki silicon carbide na-arụ ọrụ dị elu (nhọrọ gụnyere Coresic® SP ma ọ bụ usoro Marvel Sic) na usoro nhazi dị fechaa, ha na-enweta ịdị arọ ultra-light na isi ike dị elu (modules elastic> 400 GPa), yana ọnụọgụ ọnụọgụ dị ala nke mgbasawanye ọkụ (≈ 4.5. njupụta (porosity <0.1%), na-ahụ nkwụsi ike nanometric (flatness / parallelism ≤1μm) n'okpuru nrụgide okpomọkụ na nke igwe Ngwongwo ha jikọtara ọnụ na-akwado ọrụ dị elu na ngwa ngwa dị elu (dịka, 1m / s, 4G), na-eme ka ha dị mma maka igwe lithography, usoro nyocha wafer, na mmepụta nke ọma, na-eme ka ntụgharị ziri ezi na nzaghachi dị ike.
Ngwa ihe ngagharị nke Silicon Carbide (SiC).
Ngwa ihe eji eme ihe nke silicon Carbide (SiC) bụ akụkụ dị oke egwu emere maka sistemụ ngagharị semiconductor dị elu, na-eji ihe SiC dị elu (dịka Coresic® SP ma ọ bụ usoro Marvel Sic, porosity <0.1%) na nhazi nhazi dị fechaa iji nweta oke ọkụ dị elu na modulu 0. Site na ọnụọgụ dị ala nke mgbasawanye thermal (≈4.5 × 10⁻⁶ / ℃), ha na-ahụ nkwụsi ike nanometric (flatness / parallelism ≤1μm) n'okpuru mgbanwe ọkụ. Ngwongwo ndị a jikọtara ọnụ na-akwado ọrụ dị elu na ngwa ngwa dị elu (dịka, 1m / s, 4G), na-eme ka ha dị mma maka igwe lithography, usoro nyocha wafer, na mmepụta nke ọma, na-eme ka ntụgharị ziri ezi na nzaghachi dị ike.
Silicon Carbide (SiC) Mpempe ụzọ ngwa anya
Silicon Carbide (SiC) Optical Path Plate bụ isi ikpo okwu emebere maka sistemu ụzọ ụzọ abụọ na ngwa nyocha wafer. Emepụtara site na seramiiki silicon carbide dị elu, ọ na-enweta oke dị fechaa (njupụta ≈3.1 g / cm³) na isi ike dị elu (modules> 400 GPa) site na nhazi nhazi dị fechaa, ebe ọ na-egosipụta ọnụọgụ dị ala nke mgbasawanye ọkụ. (≈4.5 × 10⁻⁶ / ℃) na nnukwu njupụta (porosity <0.1%), na-eme ka nkwụsi ike nanometric (flatness / parallelism ≤0.02mm) n'okpuru mgbanwe ọkụ na n'ibu. Na ya nnukwu kacha size (900 × 900mm) na ahụkebe keukwu arụmọrụ, ọ na-enye ogologo oge kwụsiri ike arịọnụ baseline maka ngwa anya usoro, budata na-eme nnyocha ziri ezi na ntụkwasị obi. A na-eji ya eme ihe n'ọtụtụ ebe na semiconductor metrology, nhazi ngwa anya, na sistemụ onyonyo dị elu.
Ihe eserese + Tantalum Carbide mkpuchi mkpuchi
The Graphite + Tantalum Carbide Coated Guide Ring bụ ihe dị oke mkpa emebere maka ngwa ngwa uto kristal silicon carbide (SiC). Isi ọrụ ya bụ ka ọ na-eduzi ọkụ ọkụ dị elu nke ọma, na-eme ka ịdị n'otu na nkwụsi ike nke ebe okpomọkụ na eruba n'ime ụlọ mmeghachi omume. Emepụtara site na mkpụrụ graphite dị ọcha (dị ọcha> 99.99%) kpuchie ya na oyi akwa tantalum carbide (TaC) nke CVD (nke na-ekpuchi adịghị ọcha <5 ppm), ọ na-egosiputa conductivity thermal pụrụ iche (≈120 W / m·K) yana enweghị oke okpomọkụ. 2200°C), nke ọma na-egbochi corrosion silicon vapor corrosion na igbochi mgbasa adịghị ọcha. Ihe mkpuchi dị elu nke mkpuchi (mgbanwe <3%, mkpuchi zuru oke) na-eme ka ntụzịaka gas na-agbanwe agbanwe na ntụkwasị obi ọrụ ogologo oge, na-eme ka ịdị mma na mkpụrụ nke SiC otu kristal dị elu.
Silicon Carbide (SiC) ọkụ Tube Abstract
Silicon Carbide (SiC) Igwe ọkụ kwụ ọtọ
Silicon Carbide (SiC) Vetikal Furnace Tube bụ akụrụngwa dị oke mkpa emebere maka akụrụngwa ụlọ ọrụ na-ekpo ọkụ, nke na-arụ ọrụ dị ka tube nchebe mpụga iji hụ na nkesa ọkụ dị n'ime ọkụ dị n'okpuru ikuku ikuku, yana ọnọdụ okpomọkụ na-arụ ọrụ gburugburu 1200 ° C. Emepụtara ya site na teknụzụ nrụpụta agbakwunyere 3D, ọ nwere isi ihe adịghị ọcha <300 ppm, ma nwee ike ịnwe ya na mkpuchi mkpuchi silicon carbide CVD (ihe mkpuchi <5 ppm). Ijikọta elu thermal conductivity (≈20 W / m·K) na pụrụ iche thermal ujo kwụsie ike (na-eguzogide thermal gradients> 800 ° C), ọ na-ọtụtụ ebe na-eji na elu okpomọkụ Filiks dị ka semiconductor okpomọkụ ọgwụgwọ, photovoltaic ihe sintering, na nkenke seramiiki mmepụta, budata na-eme ka a pụrụ ịdabere na ngwá ọrụ na ogologo oge.
Silicon Carbide (SiC) Igwe ọkụ kwụ ọtọ tube
The Silicon Carbide (SiC) Horizontal Furnace Tube bụ isi akụrụngwa emebere maka usoro okpomọkụ dị elu, na-eje ozi dị ka tube usoro na-arụ ọrụ na ikuku nwere oxygen (gas na-emeghachi omume), nitrogen (gasị nchebe), na trace hydrogen chloride, yana ọnọdụ okpomọkụ na-arụ ọrụ nke ihe dịka 1250 ° C. Emepụtara ya site na teknụzụ nrụpụta agbakwunyere 3D, ọ nwere isi ihe adịghị ọcha <300 ppm, ma nwee ike ịnwe ya na mkpuchi mkpuchi silicon carbide CVD (ihe mkpuchi <5 ppm). Ijikọta elu thermal conductivity (≈20 W / m·K) na pụrụ iche thermal ujo kwụsie ike (na-eguzogide thermal gradients> 800 Celsius C), ọ dị mma maka achọ semiconductor ngwa dị ka oxidation, mgbasa, na mkpa-film nkwụnye ego, huu structural iguzosi ike n'ezi na ogologo oge dị ọcha ọnọdụ, ikuku dị ọcha.
SiC Ceramic Fork Arms Okwu Mmalite
Mmepụta Semiconductor
Na semiconductor wafer n'ichepụta, ogwe aka seramiiki SiC na-ejikarị maka ịnyefe na idobe wafer, nke a na-ahụkarị na:
- Akụrụngwa Nhazi Wafer: Dị ka cassettes wafer na ụgbọ mmiri na-arụ ọrụ, nke na-arụ ọrụ nke ọma na gburugburu usoro okpomọkụ na nke na-emebi emebi.
- Machines Lithography: A na-eji ya n'ime ihe ndị ziri ezi dị ka ọkwa, ntuziaka, na ogwe aka rọbọt, ebe nrụrụ ha dị elu na nrụrụ ọkụ dị ala na-eme ka izi ezi ngagharị nanometer dị ala.
- Usoro Etching na Diffusion: Ije ozi dị ka trays ICP etching na components maka usoro mgbasa ozi semiconductor, ịdị ọcha ha dị elu na nguzogide corrosion na-egbochi mmetọ n'ime ụlọ nhazi.
Ụlọ ọrụ mmepụta ihe na Robotics
ogwe aka seramiiki SiC bụ ihe dị oke mkpa na robots ụlọ ọrụ na-arụ ọrụ dị elu yana akụrụngwa akpaaka:
- Robotic End Effectors: A na-eji maka njikwa, mgbakọ na ọrụ nkenke. Ngwongwo ha dị fechaa (njupụta ~ 3.21 g / cm³) na-eme ka ọsọ robot na arụmọrụ dị elu, ebe ike ha dị elu (ike siri ike nke Vickers ~ 2500) na-eme ka ọ bụrụ ihe mgbochi pụrụ iche.
- Ahịrị mmepụta akpaaka: N'ọnọdụ ndị chọrọ ogologo oge dị elu, njikwa zuru oke (dịka, ụlọ nkwakọba ihe e-commerce, nchekwa ụlọ nrụpụta), ogwe aka ndụdụ SiC na-ekwe nkwa ịrụ ọrụ kwụsiri ike ogologo oge.
Aerospace na New Energy
N'ebe dị oke egwu, ogwe aka seramiiki SiC na-eme ka nguzogide ha dị elu, nguzogide corrosion, na nguzogide ujo:
- Aerospace: A na-eji ya na akụkụ dị egwu nke ụgbọ elu na drones, ebe ihe ha dị arọ na ike dị elu na-enyere aka belata ibu ma kwalite arụmọrụ.
- Ike ọhụrụ: etinyere na akụrụngwa mmepụta maka ụlọ ọrụ fotovoltaic (dịka ọmụmaatụ, ọkụ mgbasa ozi) yana dị ka ihe nhazi nke ọma na nrụpụta batrị lithium-ion.

Nhazi ụlọ ọrụ dị elu
ogwe aka seramiiki SiC nwere ike iguzogide okpomọkụ karịrị 1600C, na-eme ka ha dabara maka:
- Metallurgy, Ceramics, na Glass Industries: A na-eji ya na ndị na-ahụ maka okpomọkụ dị elu, efere setter, na efere akwagharị.
- Ike Nuklia: N'ihi nguzogide radieshon ha, ha dabara maka ụfọdụ ihe ndị dị na reactors nuklia.
Ngwa ahụike
Na ngalaba ahụike, a na-eji ogwe aka seramiiki SiC mee ihe maka:
- Robots ọgwụ na ngwa ịwa ahụ: Ndị bara uru maka ndakọrịta biocyte ha, nguzogide corrosion na nkwụsi ike na gburugburu igba ogwu.
Nchịkọta mkpuchi mkpuchi SiC
| Njirimara ahụkarị | Nkeji | Ụkpụrụ |
| Nhazi |
| FCC β oge |
| Nhazi | Nkeji (%) | 111 họọrọ |
| Nnukwu njupụta | g/cm³ | 3.21 |
| Isi ike | Vickers isi ike | 2500 |
| Ike ikpo ọkụ | J·kg-1 · K-1 | 640 |
| Mgbasa ọkụ 100–600 Celsius (212–1112 Celsius) | 10-6K-1 | 4.5 |
| Modul nke Young | GPA (4pt gbagọọ, 1300 ℃) | 430 |
| Nha ọka | μm | 2 ~ 10 |
| Sublimation okpomọkụ | ℃ | 2700 |
| Ike Felexural | MPa (RT 4-isi) | 415 |
| Thermal conductivity | (W/mK) | 300 |
Nlebanya akụkụ ihe owuwu seramiiki Silicon Carbide
Nchịkọta akụkụ SiC Akara
Akara SiC bụ nhọrọ dị mma maka gburugburu ebe dị egwu (dị ka okpomọkụ dị elu, nrụgide dị elu, mgbasa ozi na-emebi emebi, na akwa ọsọ ọsọ) n'ihi ike ha pụrụ iche, na-eyi nkwụsi ike, nguzogide okpomọkụ dị elu (na-eguzogide okpomọkụ ruo 1600 ° C ma ọ bụ ọbụna 2000 ° C), na nkwụsị corrosion. Ha elu thermal conductivity na-eme ka ikpochapụ ọkụ dị mma, ebe obere esemokwu esemokwu na ihe ndị na-edozi onwe ha na-eme ka a ghara ịdabere na njedebe na ogologo ndụ ọrụ n'okpuru ọnọdụ ọrụ dị oke egwu. Àgwà ndị a na-eme ka akara SiC na-ejikarị eme ihe na ụlọ ọrụ dị ka petrochemicals, Ngwuputa, mmepụta semiconductor, ọgwụgwọ mmiri na-ekpofu mmiri, na ike, na-ebelata ụgwọ ọrụ mmezi, na-ebelata oge nkwụsị, na ịkwalite arụmọrụ na nchekwa akụrụngwa.
SiC seramiiki efere Brief
Silicon Carbide (SiC) efere seramiiki bụ ndị ama ama maka ike siri ike ha (Mohs hardness ruo 9.5, nke abụọ naanị na diamond), ihe nrụpụta ọkụ pụtara ìhè (karịa ọtụtụ ceramik maka njikwa okpomọkụ nke ọma), yana kemịkalụ kemịkalụ dị ịrịba ama na inertness na-ekpo ọkụ (na-eguzogide alkalis siri ike na ọkụ ọkụ). Ngwongwo ndị a na-eme ka nkwụsi ike nhazi na arụmọrụ a pụrụ ịdabere na ya na gburugburu ebe dị egwu (dịka ọmụmaatụ, okpomọkụ dị elu, abrasion, na corrosion), na-agbatị ndụ ọrụ ma na-ebelata mkpa nlekọta.
A na-eji efere seramiiki SiC eme ihe n'ọtụtụ ebe na-arụ ọrụ dị elu:
• Ngwá ọrụ abrasives na egweri: Ịkwado ike siri ike dị elu maka ịmepụta wiil egweri na ngwaọrụ polishing, na-eme ka nkenke na ịdịte aka na gburugburu abrasive.
• Ihe Ntugharị : Na-eje ozi dị ka ihe mkpuchi ọkụ na ngwa ọkụ, na-ejigide nkwụsi ike n'elu 1600 ° C iji melite arụmọrụ okpomọkụ ma belata ụgwọ ọrụ.
• Ụlọ ọrụ Semiconductor: Na-arụ ọrụ dị ka ihe ntinye maka ngwaọrụ eletrik dị elu (dịka ọmụmaatụ, diodes ike na RF amplifiers), na-akwado ọrụ voltaji na okpomọkụ dị elu iji kwalite ntụkwasị obi na ike ike.
• Nkedo na ịgbaze: Dochie ihe ọdịnala na nhazi igwe iji hụ na mbufe ọkụ na-arụ ọrụ nke ọma na nguzogide corrosion kemịkalụ, na-eme ka ịdị mma ọla na ọnụ ahịa dị mma.
SiC Wafer Boat Abstract
Ụgbọ mmiri seramiiki XKH SiC na-ebuga nkwụsi ike dị elu, kemịkalụ kemịkalụ, injinia ziri ezi, na arụmọrụ akụ na ụba, na-enye ihe ngwọta na-ebu ọrụ dị elu maka nrụpụta semiconductor. Ha na-akwalite nchekwa nchekwa wafer nke ukwuu, ịdị ọcha na nrụpụta nrụpụta, na-eme ka ha bụrụ ihe ndị dị mkpa na nrụpụta wafer dị elu.
Ngwa ụgbọ mmiri ceramic SiC:
A na-eji ụgbọ mmiri seramiiki SiC eme ihe na usoro semiconductor n'ihu, gụnyere:
• Usoro nkwụnye ego: Dị ka LPCVD (Ntụkwasị Obi Ụzụ Mmiri Na-adịghị Ala) na PECVD (Nkwado Uzuzu Mmiri Na-eme Ka Plasma).
• Ọgwụgwọ dị elu: Gụnyere oxidation thermal, annealing, mgbasa, na ntinye ion.
• Usoro mmiri & ihicha: ihicha wafer na usoro njikwa kemịkal.
Dakọtara na ma ikuku na ikuku usoro gburugburu,
ha dị mma maka fabs na-achọ ibelata ihe egwu mmetọ ma melite arụmọrụ mmepụta.
Oke ụgbọ mmiri Wafer SiC:
| Nka nka | ||||
| Index | Nkeji | Uru | ||
| Aha ihe | Mmeghachi omume Sintered Silicon Carbide | Silicon Carbide Sintered enweghị nrụgide | Silicon Carbide recrystalized | |
| Ihe mejupụtara | RBSiC | SSiC | R-SiC | |
| Njupụta nnukwu | g/cm3 | 3 | 3.15 ± 0.03 | 2.60-2.70 |
| Ike Flexural | MPa (kpsi) | 338 (49) | 380 (55) | 80-90 (20°C) 90-100(1400°C) |
| Ike mkpakọ | MPa (kpsi) | 1120 (158) | 3970 (560) | > 600 |
| Isi ike | Kpupu | 2700 | 2800 | / |
| Na-agbaji Tenacity | MPa m1/2 | 4.5 | 4 | / |
| Nrụpụta okpomọkụ | W/mk | 95 | 120 | 23 |
| Ọnụọgụ nke Thermal Mgbasawanye | 10-6.1/°C | 5 | 4 | 4.7 |
| Okpomọkụ akọwapụtara | Joule/g 0k | 0.8 | 0.67 | / |
| Oke okpomọkụ na ikuku | ℃ | 1200 | 1500 | 1600 |
| Modul na-agbanwe | Gpa | 360 | 410 | 240 |
Ngosipụta akụrụngwa dị iche iche nke SiC ceramics
SiC seramiiki membrane
SiC seramiiki akpụkpọ ahụ bụ ihe nzacha dị elu emebere site na silicon carbide dị ọcha, na-egosipụta nrụzi oyi akwa atọ siri ike (ọkwa nkwado, oyi akwa mgbanwe, na akpụkpọ ahụ nkewa) emebere site na usoro mmeghari okpomọkụ. Nke a imewe ana achi achi pụrụ iche n'ibu ike, kpọmkwem pore size nkesa, na pụtara ìhè anwụ ngwa ngwa. Ọ na-eme nke ọma na ngwa ụlọ ọrụ mmepụta ihe dị iche iche site na ikewa nke ọma, itinye uche na ime ka mmiri dị ọcha. Ihe eji eme ihe na-agụnye mmiri na mmiri na-ekpofu mmiri (iwepụ ihe ndị a kwụsịtụrụ, nje bacteria na ihe ndị na-emerụ emerụ), nhazi nri na ihe ọṅụṅụ (na-akọwapụta na itinye uche na mmiri, mmiri ara ehi, na mmiri fermented), ọgwụ na biotechnology arụmọrụ (na-asachapụ biofluids na intermediates), nhazi kemịkalụ (nyocha mmiri na-emebi emebi na ihe na-akpata), na ntinye mmanụ na gas).
SiC Pipes
SiC (silicon carbide) tubes bụ ihe seramiiki na-arụ ọrụ dị elu emebere maka sistemu ọkụ ọkụ semiconductor, nke sitere na silicon carbide dị ọcha dị ọcha site na usoro ịgbatị dị elu. Ha na-egosiputa conductivity thermal pụrụ iche, nkwụsi ike dị elu (na-eguzogide ihe karịrị 1600 Celsius C), na nguzogide corrosion kemịkalụ. Ọnụego mgbasawanye ọkụ ha dị ala na ike ọrụ dị elu na-eme ka nkwụsi ike n'akụkụ oke ịgba ígwè, na-ebelata nrụrụ okpomọkụ na iyi. Ọkụ SiC dabara adaba maka ọkụ mgbasa, ọkụ oxidation, na sistemụ LPCVD/PECVD, na-enye ike nkesa otu ọnọdụ okpomọkụ na ọnọdụ usoro kwụsiri ike iji belata ntụpọ wafer ma melite ịdị n'otu ihe nkiri dị mkpa. Tụkwasị na nke ahụ, nnukwu, usoro na-adịghị agbapụ na kemịkalụ kemịkalụ nke SiC na-egbochi mbuze sitere na gas na-emeghachi omume dị ka oxygen, hydrogen, na amonia, na-agbatị ndụ ọrụ yana ịgba mbọ hụ na ịdị ọcha nke usoro. Enwere ike ịhazi tubes SiC n'ogo na ọkpụrụkpụ mgbidi, yana iji nhazi nke ọma na-enweta elu dị n'ime nke ọma yana itinye uche dị elu iji kwado ọsọ laminar na profaịlụ okpomọkụ kwụ ọtọ. Nhọrọ nke polishing ma ọ bụ mkpuchi ihu na-ebelata ọgbọ irighiri ma kwalite nguzogide corrosion, na-ezute ihe siri ike nke nrụpụta semiconductor maka nkenke na ntụkwasị obi.
SiC Ceramic Cantilever Paddle
Nhazi monolithic nke SiC cantilever agụba na-eme ka nrụpụta ọrụ siri ike na ịdị n'otu ọkụ na-ekpochapụ nkwonkwo na isi adịghị ike a na-ahụkarị na ihe mejupụtara. A na-egbuchapụ elu ha nke ọma ruo na nso-enyo enyo, na-ebelata ọgbọ na-ezute ụkpụrụ ụlọ dị ọcha. Inertia kemịkalụ kemịkalụ nke SiC na-egbochi ịpụ apụ, corrosion, na mmetọ usoro na gburugburu mmeghachi omume (dịka, oxygen, uzuoku), na-ahụ nkwụsi ike na ntụkwasị obi na usoro mgbasa ozi / oxidation. N'agbanyeghị ịgba ígwè ọkụ ọkụ ngwa ngwa, SiC na-edobe iguzosi ike n'ezi ihe nhazi, na-agbatị ndụ ọrụ yana ibelata oge mmezi. Ọdịdị dị fechaa nke SiC na-enyere aka nzaghachi ọkụ ngwa ngwa, na-eme ka ọnụego kpo oku / oyi na-eme ka ọ dịkwuo mma ma na-eme ka arụpụta ọrụ na ike dị mma. Mpempe akwụkwọ ndị a dị n'ụdị nhazi (dakọtara na 100mm ruo 300mm+ wafers) ma na-eme mgbanwe maka ụdị ọkụ dị iche iche, na-ebuga arụmọrụ na-agbanwe agbanwe na ma n'ihu na azụ azụ semiconductor usoro.
Okwu Mmalite Alumina Vacuum Chuck
Al₂O₃ vacuum chucks bụ ngwaọrụ dị oke mkpa na nrụpụta semiconductor, na-enye nkwado kwụsiri ike na nke ziri ezi n'ofe ọtụtụ usoro:• Thinning : Na-enye nkwado otu n'oge ịhịa aka n'ahụ, na-ahụ na mbelata mkpụrụ osisi dị elu dị elu iji kwalite mgbasa ọkụ mgbawa na ịrụ ọrụ ngwaọrụ.
• Dicing: Na-enye mgbasa ozi echekwara echekwabara n'oge dicing wafer, na-ebelata ihe egwu mmebi yana hụ na mbelata dị ọcha maka ibe ọ bụla.
• Nhicha: elu ya dị larịị, otu ụdị mgbasa ozi na-enyere aka iwepụ mmetọ dị mma na-enweghị imebi wafers n'oge usoro nhicha.
• Ụgbọ njem: Na-enye nkwado a pụrụ ịdabere na ya na nke echekwara n'oge njikwa wafer na njem, na-ebelata ihe ize ndụ nke mmebi na mmetọ.

1.Uniform Micro-Porous Ceramic Technology
•Utilizes nano-powders kee evenly ekesa na interconnected pores, na-akpata na elu porosity na a uniformly ok Ọdịdị maka agbanwe agbanwe na a pụrụ ịdabere na wafer nkwado.
2.Exceptional Material Properties
-Emepụtara si ultra-dị ọcha 99.99% alumina (Al₂O₃), ọ na-egosipụta:
• Ngwongwo thermal : Igwe ọkụ dị elu na nrụpụta ọkụ dị mma, dabara maka gburugburu semiconductor okpomọkụ dị elu.
• Mechanical Properties : Ike dị elu na ike siri ike na-eme ka ọ dị ogologo ndụ, nguzogide iyi, na ogologo ndụ ọrụ.
• Uru ndị ọzọ: Igwe ọkụ eletrik dị elu na nguzogide corrosion, na-agbanwe agbanwe na ọnọdụ nrụpụta dị iche iche.
3. Dị elu flatness na Parallelism• Na-ahụ maka njikwa wafer ziri ezi na nke kwụsiri ike na ịdị elu dị elu na myirịta, na-ebelata ihe egwu mmebi yana hụ na nsonaazụ nhazi na-agbanwe agbanwe. Ya mma ikuku permeability na edo adsorption ike n'ihu welie arụmọrụ ntụkwasị obi.
The Al₂O₃ vacuum chuck na-ejikọta teknụzụ micro-porous dị elu, ihe onwunwe pụrụ iche, na nkenke dị elu iji kwado usoro semiconductor dị oke mkpa, na-ahụ na arụmọrụ, ntụkwasị obi, na njikwa mmetọ gafee thinning, dicing, ihicha, na ibufe nkebi.

Alumina Robot Arm & Alumina Ceramic End Effector Brief
Alumina (Al₂O₃) ogwe aka robotic seramiiki bụ ihe dị mkpa maka njikwa wafer na nrụpụta semiconductor. Ha na-akpọtụrụ wafers ozugbo ma na-ahụ maka ịnyefe na idobe ya na gburugburu ebe na-achọsi ike dị ka oghere ma ọ bụ ọnọdụ okpomọkụ dị elu. Isi uru ha bara n'ịhụ na nchekwa wafer, igbochi mmetọ, yana melite arụmọrụ akụrụngwa yana mpụta site na njirimara ihe pụrụ iche.
| Akụkụ akụkụ | Nkọwa zuru ezu |
| Mechanical Properties | Alumina dị elu dị ọcha (dịka,> 99%) na-enye ike siri ike (Mohs hardness ruo 9) na ike mgbanwe (ruo 250-500 MPa), na-eme ka nguzogide iyi na nkwụsị nrụrụ, si otú a na-agbatị ndụ ọrụ.
|
| Ihe mkpuchi eletrik | Iguzogide okpomọkụ nke ụlọ ruo 10¹⁵ Ω·cm na ike mkpuchi nke 15 kV/mm na-egbochi mwepu electrostatic nke ọma (ESD), na-echebe wafers nwere mmetụta na nnyonye anya eletriki na mmebi.
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| Thermal Stability | Ebe mgbaze dị elu dị ka 2050 ° C na-enyere aka ịnagide usoro okpomọkụ dị elu (dịka, RTA, CVD) na mmepụta semiconductor. Ọnụọgụ mgbasawanye ọkụ dị ala na-ebelata ọgụ ma na-edobe nkwụsi ike nke akụkụ n'okpuru okpomọkụ.
|
| Chemical Inertness | Inert na ọtụtụ acids, alkalis, gas na-eme ihe, na ndị na-ehicha ihe, na-egbochi mmerụ ahụ ma ọ bụ mwepụta ion metal. Nke a na-eme ka gburugburu mmepụta ihe dị oke ọcha ma na-ezere mmetọ n'elu wafer.
|
| Uru ndị ọzọ | Nkà na ụzụ nhazi ndị tozuru okè na-enye ọnụ ahịa dị elu; Enwere ike ịchacha elu ya nke ọma ka ọ dị ala, na-ebelata ihe egwu dị n'ọgbọ.
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A na-eji ogwe aka robotic seramiiki alumina eme ihe na usoro nrụpụta semiconductor n'ihu, gụnyere:
• Ijikwa na ọnọdụ wafer: Na nchekwa na kpomkwem nyefe na ọnọdụ wafers (dịka, 100mm ruo 300mm+ nha) na oghere ma ọ bụ gburugburu ikuku inert dị elu, na-ebelata mmebi na ihe egwu mmetọ.
• Usoro okpomọkụ dị elu: dị ka ngwa ngwa ọkụ ọkụ ọkụ (RTA), kemịkalụ vapor deposition (CVD), na plasma etching, ebe ha na-ejigide nkwụsi ike n'okpuru okpomọkụ dị elu, na-eme ka usoro na-agbanwe agbanwe na mkpụrụ.
• Automated Wafer Handling Systems : Ejikọtara n'ime robots na-ejikwa wafer dị ka ndị na-eme ihe njedebe iji rụọ ọrụ nnyefe wafer n'etiti akụrụngwa, na-eme ka nrụpụta ọrụ dị mma.
Mmechi
XKH bụ ọkachamara na R & D na mmepụta nke silicon carbide (SiC) na alumina (Al₂O₃) ihe ndị dị na seramiiki, gụnyere ogwe aka robotic, paddle cantilever, vacuum chucks, wafer ụgbọ mmiri, ọkụ ọkụ, na akụkụ ndị ọzọ dị elu, na-eje ozi semiconductors, ike ọhụrụ, ikuku ikuku, na elu-temperature. Anyị na-agbaso n'ichepụta nkenke, njikwa mma na teknụzụ teknụzụ dị elu, na-eme ka usoro sintering dị elu (dịka ọmụmaatụ, sintering na-enweghị nrụgide, mmeghachi omume mmeghachi omume) na usoro nhazi nkenke (dịka ọmụmaatụ, ichicha CNC, polishing) iji hụ na nguzogide okpomọkụ dị elu, ike igwe, inertness kemịkalụ, na nha nha. Anyị na-akwado nhazi nke dabere na eserese, na-enye azịza ahaziri maka nha, ụdị, ngwucha elu na akara ihe iji zute ihe ndị ahịa chọrọ. Anyị na-agba mbọ ịnye ihe seramiiki a pụrụ ịdabere na ya na nke ọma maka mmepụta ihe dị elu zuru ụwa ọnụ, na-eme ka arụmọrụ ngwá ọrụ na mmepụta mmepụta ihe maka ndị ahịa anyị.






























