Nkọwa zuru oke nke usoro ntinye ihe nkiri dị mkpa: MOCVD, Magnetron Sputtering, na PECVD

N'ichepụta semiconductor, ebe fotolithography na etching bụ usoro a na-ekwukarị, usoro ntinye ihe nkiri epitaxial ma ọ bụ dị mkpa dịkwa oke egwu. Edemede a na-ewebata ọtụtụ ụzọ ntinye ihe nkiri dị mkpa na-ejikarị eme mgbawa, gụnyereMOCVD, ndọta magnetron, naPECVD.

Kedu ihe kpatara usoro ihe nkiri dị mkpa ji dị mkpa na nrụpụta Chip?

Iji maa atụ, were ya na otu achịcha dị larịị esighe. N'onwe ya, ọ nwere ike na-atọ ụtọ. Otú ọ dị, site na iji nri dị iche iche na-ehichapụ elu-dị ka pasta agwa ma ọ bụ sirop malt dị ụtọ-ị nwere ike gbanwee ụtọ ya kpamkpam. Ihe mkpuchi ndị a na-eme ka ụtọ dị kaihe nkiri dị mkpana semiconductor Filiks, mgbe flatbread n'onwe ya na-anọchi anyamkpụrụ.

N'ichepụta mgbawa, ihe nkiri ndị dị mkpa na-arụ ọrụ dị iche iche na-arụ ọrụ - mkpuchi mkpuchi, conductivity, passivation, absorption light, wdg-na ọrụ ọ bụla chọrọ usoro nkwụnye ego.

1. Metal-Organic Chemical Vapor Deposition (MOCVD)

MOCVD bụ usoro dị elu nke ukwuu na nke ziri ezi ejiri maka ntinye nke ihe nkiri dị mkpa nke semiconductor dị elu na nanostructures. Ọ na-arụ ọrụ dị mkpa n'ichepụta ngwaọrụ dị ka LEDs, lasers, na eletriki eletrik.

Ngwa ndị dị mkpa nke sistemu MOCVD:

• Sistemụ nnyefe gas
  Ọrụ maka kpọmkwem iwebata reactants n'ime mmeghachi omume ụlọ. Nke a gụnyere njikwa eruba:

• Ndị na-ebu gas

• Metal-organic precursors

• Hydride gas
  Sistemu ahụ nwere valvụ ọtụtụ ụzọ maka ịgbanwe n'etiti uto na ụdị nhicha.

• Ụlọ mmeghachi omume
  Obi nke usoro ebe uto ihe onwunwe n'ezie na-apụta. Ngwa gụnyere:

  • graphite susceptor (njide substrate)

  • Igwe ọkụ na ihe mmetụta okpomọkụ

  • Ọdụ ụgbọ mmiri anya maka nleba anya n'ime ọnọdụ

  • ogwe aka robotic maka ịkwanye/ebutu wafer akpaghị aka

• Sistemụ Njikwa Uto
  Ndị nwere njikwa mgbagha nwere ike ime mmemme yana kọmpụta nnabata. Ndị a na-eme ka nleba anya na nkwughachi nke ọma n'oge usoro ntinye ego.

• Nleba anya n'ime ọnọdụ
  Ngwá ọrụ dị ka pyrometers na reflectometer na-atụ:

  • Ọkpụrụkpụ ihe nkiri

  • Okpomọkụ dị n'elu

  • Curvature mkpụrụ
    Ndị a na-eme ka nzaghachi ozugbo na mmezi.

• Usoro ọgwụgwọ mkpofu
  Na-emeso ngwaahịa ndị na-egbu egbu site na iji ire ere ọkụ ma ọ bụ catalysis kemịkalụ iji hụ na nchekwa na nnabata gburugburu ebe obibi.

Nhazi isi ụlọ ịsa ahụ mechiri emechi (CCS):

Na reactors MOCVD kwụ ọtọ, imewe CCS na-enye ohere ịgbanye gas n'otu n'otu site na nozzles ndị ọzọ na nhazi isi ịsa ahụ. Nke a na-ebelata mmeghachi omume akaghi aka ma kwalite ngwakọta otu.

• Nkegraphite susceptor na-atụgharịn'ihu na-enyere aka homogenize ókè oyi akwa nke gas, mma film uniformity gafee wafer.

2. Magnetron sputtering

Ịgbasa magnetik bụ usoro ntinye ego nke anụ ahụ (PVD) nke a na-eji eme ihe n'ọtụtụ ebe maka itinye ihe nkiri na mkpuchi dị mkpa, karịsịa na ngwá electronic, optics na ceramics.

Ụkpụrụ ọrụ:

1. Ihe ezubere iche
   A na-edobe isi iyi nke a ga-edobe - metal, oxide, nitride, wdg - na-edozi na cathode.

2. Ụlọ Vacuum
   A na-eme usoro a n'okpuru nnukwu oghere iji zere mmetọ.

3. Ọgbọ Plasma
   A na-etinye gas na-adịghị agwụ agwụ, nke dị ka argon, iji mepụta plasma.

4. Ngwa Ubi Igwe Ọdụdọ
   Ebe ndọta na-egbochi elektrọn n'akụkụ ebumnuche iji kwalite arụmọrụ ionization.

5. Usoro ịgbasa
   Ions na-atụ bọmbụ ndị e lekwasịrị anya, na-ebupụ atom ndị na-aga n'ime ụlọ ahụ ma tinye n'ime mkpụrụ.

Uru nke Magnetron Sputtering:

• Ndokwa ihe nkiri Uniformgafee nnukwu mpaghara.

• Ikike itinye ihe mgbagwoju anya, gụnyere alloys na ceramik.

• Oke Usoro Ntugharịmaka njikwa zuru oke nke ọkpụrụkpụ, nhazi, na microstructure.

• Ogo ihe nkiri dị eluna ike adhesion na n'ibu ike.

• Ndakọrịta ihe sara mbara, site na ọla ruo oxides na nitrides.

• Ọrụ Obere Okpomọkụ, dabara adaba maka ihe ndị nwere mmetụta okpomọkụ.

3. Ndobe mmiri ọkụ na-eme ka Plasma kwalitere (PECVD)

A na-eji PECVD eme ihe n'ọtụtụ ebe maka itinye ihe nkiri dị mkpa dị ka silicon nitride (SiNx), silicon dioxide (SiO₂), na silicon amorphous.

Ụkpụrụ:

N'ime usoro PECVD, a na-ewebata gasị ndị na-ebu ụzọ banye n'ime oghere ebe aplasma na-egbuke egbukeA na-emepụta ya site na:

• RF mkpali

• DC voltaji dị elu

• Microwave ma ọ bụ isi mmalite pulsed

Plasma na-eme ka mmeghachi omume nke gas na-arụ ọrụ, na-emepụta ụdị mmeghachi omume nke na-etinye na mkpụrụ ahụ ka ọ bụrụ ihe nkiri dị mkpa.

Nzọụkwụ nkwụnye ego:

1. Nhazi Plasma
   N'ime obi ụtọ site na oghere electromagnetic, gas ndị na-ebu ụzọ ionize ka ha mepụta radicals na ion.

2. Mmeghachi omume na Ụgbọ njem
   Ụdị ndị a na-enweta mmeghachi omume nke abụọ ka ha na-aga n'ihu mkpụrụ.

3. Mmetụta dị n'elu
   Mgbe ha ruru mkpụrụ osisi ahụ, ha na-adaba, meghachi omume, ma mepụta ihe nkiri siri ike. A na-ewepụta ụfọdụ ngwaahịa dị ka gas.

Uru PECVD:

• Ịdị n'otu mara mmana ihe nkiri ihe nkiri na ọkpụrụkpụ.

• Adhesion siri ikeọbụlagodi na ọnọdụ okpomọkụ dị ntakịrị.

• Ọnụ ego nkwụnye ego dị elu, na-eme ka ọ dị mma maka mmepụta nke ụlọ ọrụ mmepụta ihe.

4. Usoro njirimara ihe nkiri dị mkpa

Ịghọta njirimara nke ihe nkiri dị mkpa dị mkpa maka njikwa mma. Usoro ndị a na-ahụkarị gụnyere:

(1) Mgbasa X-ray (XRD)

• Ebumnuche: Nyochaa ihe owuwu kristal, nghazi lattice, na nghazi.

• Ụkpụrụ: Dabere na Iwu Bragg, tụọ ka X-ray si gbasa site na ihe kristal.

• Ngwa: Crystallography, nyocha nke usoro, nha anya, na nyocha ihe nkiri dị mkpa.

(2) Ịnyocha Electron Microscope (SEM)

• Ebumnuche: Lelee ọdịdị ọdịdị elu na microstructure.

• Ụkpụrụ: Na-eji ọkụ eletrik na-enyocha elu nlele. Ngosipụta achọpụtara (dịka ọmụmaatụ, eletrọn nke abụọ na azụ azụ) na-ekpughe nkọwa elu.

• Ngwa: Sayensị ihe onwunwe, nanotech, bayoloji, na nyocha ọdịda.

(3) Atomic Force Microscope (AFM)

• Ebumnuche: Ihe onyonyo na-ebuli na atomiki ma ọ bụ mkpebi nanometer.

• Ụkpụrụ: Nchọpụta dị nkọ na-enyocha elu ma na-ejigide ike mmekọrịta mgbe niile; Ntugharị kwụ ọtọ na-emepụta ọdịdị ọdịdị 3D.

• Ngwa: Nchọpụta nke Nanostructure, nleba anya nhụsianya elu, ọmụmụ biomolecular.