Ihe nkiri mgbochi ntụgharị uche nke ejiri ihe mkpuchi silicon monocrystalline silicon kpuchie nke ọma

Lensi silicon a kpụchara akpụcha nke e ji ihe nkiri AR na-emegide ntụgharị uche kpuchie, nke e ji ihe mkpuchi pụrụ iche kpuchie.

Nkọwa Dị Mkpirikpi:

Lensi silicon monocrystalline a kpụchara akpụcha bụ ihe na-arụ ọrụ anya nke dabere na silicon monocrystalline dị ọcha (Si) site na nhazi optical na teknụzụ mkpuchi ziri ezi. Silicon monocrystalline nwere nnyefe ìhè dị mma na eriri infrared (1.2-7μm), yana mkpuchi dịka ihe nkiri anti-reflection (AR), ihe nkiri reflection dị elu (HR) ma ọ bụ ihe nkiri nzacha, ọ nwere ike ime ka arụmọrụ transmittance ma ọ bụ reflection nke eriri kpọmkwem ka mma. A na-eji ngwaahịa ndị a eme ihe nke ukwuu na onyonyo infrared, optics laser na nchọpụta semiconductor.

Zitere anyị ozi-e

atụmatụ

Njirimara nke lenzi silicon a kpuchiri ekpuchi:

1. Arụmọrụ anya:
Oke nnyefe: 1.2-7μm (dị nso infrared ruo etiti infrared), nnyefe >90% na eriri windo ikuku 3-5μm (mgbe mkpuchi gasịrị).
N'ihi nnukwu ihe ngosi nke na-egosi ihe na-egbukepụ egbukepụ (n≈ 3.4@4μm), a ga-etinye ihe nkiri na-egbochi ntụgharị uche (dịka MgF₂/Y₂O₃) iji belata mfu ntụgharị uche elu.

2. Nkwụsi ike nke okpomọkụ:
Ọnụọgụ mgbasa okpomọkụ dị ala (2.6×10⁻⁶/K), iguzogide okpomọkụ dị elu (okpomọkụ ọrụ ruo 500℃), dabara adaba maka ngwa laser ike dị elu.

3. Njirimara igwe:
Ike siri ike nke Mohs 7, iguzogide ọkọ, mana ọ na-agbawa agbawa nke ukwuu, chọrọ nchebe n'akụkụ chamfering.

4. Àgwà mkpuchi:
Customized anti-reflection film (AR@3-5μm), high reflection film (HR@10.6μm for CO₂ laser), bandpass filter film, etc.

Ngwa mkpuchi silicone:

(1) Sistemụ onyonyo okpomọkụ infrared
Dịka akụkụ bụ isi nke lensị infrared (3-5μm ma ọ bụ band 8-12μm) maka nlekota nchekwa, nyocha ụlọ ọrụ mmepụta ihe na ngwa ọhụụ abalị nke ndị agha.

(2) Sistemụ anya laser
Laser CO₂ (10.6μm): Lensi nwere ike ịtụgharị ihe nke ọma maka resonators laser ma ọ bụ straining beam.

Laser eriri (1.5-2μm): Lens ihe nkiri na-egbochi ntụgharị uche na-eme ka arụmọrụ njikọ dịkwuo mma.

(3) Ngwa nnwale semiconductor
Ebumnuche microscopic infrared maka nchọpụta ntụpọ wafer, nke na-eguzogide nchara plasma (a chọrọ nchedo mkpuchi pụrụ iche).

(4) ngwa nyocha spectral
Dịka akụkụ spectral nke Fourier infrared spectrometer (FTIR), a chọrọ nnyefe dị elu na obere mgbagọ ihu ebili mmiri.

Paramita teknụzụ:

Lensi silicon monocrystalline a kpụchara akpụcha aghọwo ihe dị mkpa a na-apụghị ịgbanwe agbanwe na sistemụ anya infrared n'ihi nnyefe ọkụ infrared dị mma, nkwụsi ike okpomọkụ dị elu na njirimara mkpuchi a na-ahazi. Ọrụ pụrụ iche anyị na-ahụ na lensi na-arụ ọrụ kacha mma na ngwa laser, nyocha na onyonyo.

Ọkọlọtọ	Ọnụ ego dị elu
ihe	Silikọn
Nha	5mm-300mm	5mm-300mm
Nha Nha	±0.1mm	±0.02mm
Oghere doro anya	≥90%	95%
Ogo Elu	60/40	20/10
Ebe etiti	3'	1'
Nnwere Onwe Ogologo Nlebara Anya	±2%	±0.5%
Mkpuchi	A naghị ekpuchi ya, AR, BBAR, Na-egosipụta ya

Ọrụ omenala XKH

XKH na-enye nhazi zuru oke nke lenzi silicon monocrystalline a kpuchiri ekpuchi: Site na nhọrọ nke ihe mkpuchi silicon monocrystalline (resistvion >1000Ω·cm), nhazi anya ziri ezi (spherical/aspherical, izi ezi elu λ/4@633nm), mkpuchi omenala (mgbochi ntụgharị uche/ihe nkiri ntụgharị uche dị elu/nyo, nkwado nhazi ọtụtụ band), ruo nnwale siri ike (ọnụego nnyefe, oke mmebi laser, nnwale ntụkwasị obi gburugburu ebe obibi), na-akwado obere ogbe (iberibe 10) ruo mmepụta buru ibu. Ọ na-enyekwa akwụkwọ teknụzụ (mkpuchi mkpuchi, paramita anya) na nkwado mgbe erechara iji mezuo ihe achọrọ nke sistemụ anya infrared.