Ihe mkpuchi silicon mkpuchi monocrystalline silicon omenala mkpuchi AR mgbochi ntụgharị uche
Njirimara oghere silicon mkpuchi:
1. Ọrụ anya:
Oke nnyefe: 1.2-7μm (nke dị nso na infrared na etiti infrared), nnyefe> 90% na 3-5μm ikuku windo band (mgbe mkpuchi gasịrị).
N'ihi nnukwu refractive index (n≈ 3.4@4μm), ihe nkiri mgbochi nchegharị (dị ka MgF₂/Y₂O₃) kwesịrị ka a na-edobe iji belata nhụsianya elu.
2. Nkwụsi ike okpomọkụ:
Low thermal mgbasa ọnụọgụ (2.6 × 10⁻⁶ / K), elu okpomọkụ eguzogide (arụ ọrụ okpomọkụ ruo 500 ℃), adabara elu ike laser ngwa.
3. Mechanical Njirimara:
Mohs hardness 7, nkwụsi ike ọkọ, mana nnukwu brittleness, chọrọ nchebe chamfering ihu.
4. Njirimara mkpuchi:
Customized anti-reflection film (AR@3-5μm), high reflection film (HR@10.6μm for CO₂ laser), bandpass filter film, etc.
Ngwa lens silicon mkpuchi mkpuchi:
(1) Infrared thermal imaging usoro
Dị ka akụkụ bụ isi nke anya anya infrared (3-5μm ma ọ bụ 8-12μm band) maka nlekota nchekwa, nyocha ụlọ ọrụ na akụrụngwa ọhụụ abalị.
(2) Laser ngwa anya usoro
CO₂ Laser (10.6μm): oghere reflector dị elu maka resonators laser ma ọ bụ ntugharị ọkụ.
Fiber laser (1.5-2μm): oghere ihe nkiri na-emegide echiche na-eme ka arụmọrụ njikọ dị mma.
(3) Ngwa nyocha nke Semiconductor
Ebumnuche microscopic infrared maka nchọpụta ntụpọ wafer, na-eguzogide corrosion plasma (nchebe mkpuchi pụrụ iche chọrọ).
(4) ngwa nyocha nke spectral
Dị ka akụkụ dị iche iche nke Fourier infrared spectrometer (FTIR), nnyefe dị elu na mgbagha ihu ihu dị ala dị mkpa.
Nka nka:
Lens silicon monocrystalline mkpuchi aghọọla ihe dị mkpa na-enweghị ike dochie anya na sistemụ anya infrared n'ihi oke ọkụ infrared ya dị mma, nkwụsi ike dị elu yana njirimara mkpuchi nwere ike ịhazi ya. Ọrụ omenala anyị pụrụ iche na-ahụ na arụmọrụ lenses kacha mma na ngwa laser, nyocha na ngwa onyonyo.
Ọkọlọtọ | Ọnụ ahịa dị elu | |
Ihe onwunwe | Silikoni | |
Nha | 5mm-300mm | 5mm-300mm |
Nkwenye nha nha | ± 0.1mm | ± 0.02mm |
Kpochapụ oghere | ≥90% | 95% |
Ogo elu | 60/40 | 20/10 |
Center | 3' | 1' |
Nkwenye Ogologo Focal | ±2% | ± 0.5% |
Mkpuchi | Enweghị mkpuchi, AR, BBAR, Ntụgharị uche |
Ọrụ omenala XKH
XKH na-enye nhazi nhazi zuru oke nke lenses silicon monocrystalline mkpuchi: Site na nhọrọ mkpụrụ osisi monocrystalline silicon (resistivity> 1000Ω · cm), nhazi ngwa anya nkenke (spherical / aspherical, surface correctness λ / 4 @ 633nm), mkpuchi omenala (mgbochi nchegharị / ihe ngosi dị elu / ihe nzacha, na-akwado ihe nleba anya nke ọma, na-akwado ọtụtụ ihe nleba anya na gburugburu ebe obibi), nhazi ihe nleba anya nke laser , na-akwado ihe nleba anya nke ọma, na-akwado ọtụtụ ihe nleba anya, nhazi ihe nleba anya, na-akwado ọtụtụ ihe nleba anya na njedebe nke laser. obere ogbe (10 iberibe) na nnukwu-ọnụ ọgụgụ mmepụta. Ọ na-enyekwa akwụkwọ ọrụ teknụzụ (mkpuchi mkpuchi, paramita anya) na nkwado ahịa mgbe emechara iji zute ihe ndị chọrọ nke sistemu ngwa anya infrared.
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